Ϻ˷Ƽɷ޹˾

J(rn)C ۲

Shanghai Huishuo Technology Co.,Ltd.
I(yng)ÓN܄,ڮ(gu)N܄,ڷN܄,̼?x)܄?h(hun)Ϳ܄,Чʸ߹I(y)ϴ܄,͚ζټӹ܄,X܈

  • 1
  • 2

(yng)a(chn)Ʒ

Ʒ]

+

“(lin)ϵ҂

+Ԕ(x)

ԃ

Ϻ˷Ƽɷ޹˾һн(jng)(yn)ĻW(xu)ƷI(yng)N˾ԼM(jn)ڙ(qun)Ҫ¸a(chn)Ʒȫ(gu)(ni)I(y)(w)  Ϻ˷Ƽɷ޹˾(gu)ɭڻ(ExxonMobil Chemical)̼?x)܄ͮa(chn)Ʒڙ(qun)(jng)Ṇҹ˾ѳɞИI(y)ُ͑(gu)Iɭڻa(chn)Ʒă(yu)x(yng)  ɭڻ(ExxonMobil Chemical)L(zhng)ڟN܄͘I(y)(w)󲿷և(gu)֪܄͹(yng)̣ɭڻSr(sh)Sؼ͑m(x)M͑F(xin)҂Ͱɭڻľoܺܞṩߵȵ܄a(chn)ƷԷ(du)a(chn)Ʒ(yng)üϵҪ   ÓN܄Exxsolϵ Exxsol D30,D40,D60(S),D80,D110,D130, Hexane()     (gu)N܄Isoparϵ Isopar LHMGEC     ̼?x)܄Exxsol DSP80/100      ī܄Exx-Print T82D     N܄SolvessoϵУSolvesso 100,150,200(B);     ̼?x)ϴActrelϵУActrel ED33,1140L,3338L,3356L,3363L; SomentorϵУSomentor 34,Somentor 35,Somentor 43; ȡ܄Escaid 110; ܄DIDP,DINP     Ϯa(chn)ƷV(yng)ڣI(y)ϴټӹFͿI(y)īI(y)ճτI(y)r(nng)ˎ܄(rn)܇ݮa(chn)Ʒߵذ^(gu)dȡ܄ȵ

XW(wng)
J(rn)CϢ
Ϣ

ИI(y) ܈ I(y)̘(bio) Ϻ˷Ƽɷ޹˾

I(y)ͣ ɷ޹˾ I(yng)ÓN܄,ڮ(gu)N܄,ڷN܄,̼?x)܄?h(hun)Ϳ܄,Чʸ߹I(y)ϴ܄,͚ζټӹ܄,X܈

(jng)I(yng)ģʽ +(w)+(jng)N

Y|(zh)Ϣ

˾QϺ˷Ƽɷ޹˾ ע(c)̖(ho) 310114000717334

ӛC(j)P(gun)Ϻй ˴c

ע(c)Y 1000f(wn)f(wn)Ԫ I(y)ͣɷ޹˾ȻͶYعɣ

r(sh)g2003-05-14 (jng)I(yng)ޣ 2003-05-14|L(zhng)

˾ַϺмζ^(q)(zhn)ͨ·1736Ū2̖(ho)413

(jng)I(yng) ƼI(lng)(ni)ļg(sh)_(ki)l(f)g(sh)ԃg(sh)(w)g(sh)D(zhun)׌ΣU(xin)W(xu)Ʒl(f)ԔҊ(jin)SCԭϼa(chn)ƷΣU(xin)W(xu)ƷO(jin)ػW(xu)ƷñըƷƶW(xu)ƷbʳƷӄϼӄʳr(nng)a(chn)Ʒia(chn)Ʒð؛ƷٲC(j)O(sh)ͨӍġĻkƷӮa(chn)ƷNӋ(j)C(j)ܛ_(ki)l(f)N؛M(jn)ڼg(sh)M(jn)ژI(y)(w)̄(w)ԃ횽(jng)(zhn)(xing)Ŀ(jng)P(gun)T(zhn)󷽿_(ki)չ(jng)I(yng)(dng)

Ϣ۲